Orientation control of (001) and (101) in epitaxial tetragonal Pb(Zr,Ti)O3 films with (100)/(001) and (110)/(101) mixture orientations

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  • UTSUGI Satoru
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • FUJISAWA Takashi
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • EHARA Yoshitaka
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • YAMADA Tomoaki
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • YASUI Shintaro
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • CHENTIR Mohamed-Tahar
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology
  • MORIOKA Hitoshi
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology Application Laboratory, Bruker AXS
  • IIJIMA Takashi
    Research Center for Hydrogen Industrial Use and Storage, National Institute of Advanced Industrial Science and Technology
  • FUNAKUBO Hiroshi
    Department of Innovative and Engineered Materials, Tokyo Institute of Technology

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Epitaxial tetragonal PZT films with (100)/(001) and (110)/(101) and (111) orientations were grown on various kinds of single crystal substrates having different thermal expansion coefficient. Volume fractions of (001) and (101) orientations in respective (100)/(001)- and (110)/(101)-oriented films were almost linearly increased with increasing thermal strain of the films that was generated under the cooling process after the deposition from the growth temperature to the Curie temperature. Perfectly (001)- and (101)-oriented films were grown on (111) CaF2 substrates with large thermal expansion coefficient. Observed saturation polarization values linearly changed with the volume fractions of (100) and (101) orientations.

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