Selective metallization of Ag2O-dope silicate glass by femtosecond laser direct writing
-
- WU Nan
- Department of Material Chemistry, Kyoto University
-
- WANG Xi
- Department of Material Chemistry, Kyoto University
-
- WANG Zhenxuan
- Department of Material Chemistry, Kyoto University
-
- OHNISHI Masatoshi
- Qualtec Co., Ltd.
-
- NISHI Masayuki
- Department of Material Chemistry, Kyoto University
-
- MIURA Kiyotaka
- Department of Material Chemistry, Kyoto University
-
- HIRAO Kazuyuki
- Department of Material Chemistry, Kyoto University
この論文をさがす
抄録
We investigated the selective metallization on Ag2O-doped silicate glass under femtosecond laser irradiation after electroless plating. We found, as increasing the laser power, the width of the ablated groove increased from 2.5 to 7.5 µm, and then the resulted new surface could offer an active site for reduction of Cu cations, leading to corresponding plated Cu lines with widths from 7.4 to 25.4 µm. The mechanism was supposed as irradiation of the femtosecond laser (FL) on Ag2O doped silicate glass surfaces result in the reduction of silver ions, and consequently, then the formation of silver atoms or even silver nanoparticles became the seeds for the next electroless plating process.
収録刊行物
-
- Journal of the Ceramic Society of Japan
-
Journal of the Ceramic Society of Japan 119 (1393), 697-700, 2011
公益社団法人 日本セラミックス協会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001205286966912
-
- NII論文ID
- 130002067653
-
- NII書誌ID
- AA12229489
-
- ISSN
- 13486535
- 18820743
-
- HANDLE
- 2433/163460
-
- NDL書誌ID
- 11244723
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- IRDB
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可