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- 豊田 浩孝
- 名古屋大学大学院工学研究科電子情報システム専攻
書誌事項
- タイトル別名
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- Measurement and Control of High Energy Particles in Sputter Plasma
- スパッタ プラズマチュウ ノ コウエネルギー リュウシ ケイソク ト セイギョ
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抄録
Measurement and control of high-energy Ar species in the magnetron plasma source is discussed. From energy distribution measurement of Ar+ in the plasma, existence of high-energy Ar atoms in the magnetron plasma source is confirmed. It is concluded that collision of high-energy Ar atom with background thermal Ar atom is the dominant ionization mechanism for the production of high-energy Ar+. Based on this ionization mechanism, a Monte Carlo code is developed to simulate the Ar+ energy distribution and the results are in good agreement with the experimental ones. A new technique to suppress high-energy Ar species i.e., VHF-DC superimposed magnetron sputter source, is proposed. Compared with conventional magnetron sputter sources, this new sputter source shows lower Ar energy, which is consistent with the simulation result. The VHF-DC superimposed magnetron plasma is successfully applied to the deposition of magnetic multilayer films with very thin (<1 nm) layer thickness and good magnetic anisotropy.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 51 (4), 258-263, 2008
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001205295082240
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- NII論文ID
- 10021157266
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- NII書誌ID
- AA12298652
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- BIBCODE
- 2008JVSJ...51..258T
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- COI
- 1:CAS:528:DC%2BD1cXntFCqsr4%3D
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 9501319
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可