書誌事項
- タイトル別名
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- In-situ Surface Conductivity Measurement by REM-M4PP Method
- ハンシャ デンシ ケンビキョウホウ ト ミクロ 4 タンシ プローブ ニ ヨル ヒョウメン デンキ デンドウ ソノバ ケイソク
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抄録
We have developed a surface conductivity measurement system for a UHV electron microscope (UHV-EM). The sample surfaces were prepared in the UHV-EM and their structures were observed in situ by reflection electron microscopy and diffraction (REM-RHEED). After the sample preparation, the samples were cooled down to RT and the conductance measurement was carried out. The Si(111)-7×7 and Si(111)-√3×√3-Ag structures were used as sample surfaces which were prepared on the Si(111) vicinal surface inclined toward the [112] direction by 1°. The resistance of the 7×7 structure is much larger than that of the √3×√3-Ag structure and this is consistent with the previous report. This indicates that we can measure the surface conductivity by using our system.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 51 (3), 149-151, 2008
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001205295442432
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- NII論文ID
- 10021156934
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- NII書誌ID
- AA12298652
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 9471401
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
