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Development and New Technology of Sputtering System for Large Size Substrate
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- ARAI Makoto
- ULVAC Inc. Chiba Institute for Super Materials
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- SATO Yoshikatsu
- ULVAC Inc. Flat Panel Display Division
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- KIYOTA Junya
- ULVAC Inc. Chiba Institute for Super Materials
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- SATO Shigemitsu
- ULVAC Inc. Flat Panel Display Division
Bibliographic Information
- Other Title
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- 大型ガラス基板へのスパッタリング装置の発展と新技術
- オオガタ ガラス キバン エ ノ スパッタリング ソウチ ノ ハッテン ト シンギジュツ
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Description
ULVAC has maintained a leading share in the market of sputtering deposition systems for liquid crystal display (LCD) production since 1990, when LCD market started its rapid growth. These systems are used to prepare TFT-array and transparent conductive oxide (TCO) layers in LCD. This document describes the features of our sputtering system and especially focuses on the change in design concept of the system at the Gen. 7 substrate which aimed to achieve the demands for “Simple, Small-footprint and high-productivity”. A total package we propose for the sputtering deposition production, including the target material supply and the system maintenance, is also presented. Finally, recently proposed new materials for TFT are introduced: IGZO, a high mobility TCO material, and Cu alloys for low resistivity wiring.<br>
Journal
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- Journal of the Vacuum Society of Japan
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Journal of the Vacuum Society of Japan 54 (2), 92-96, 2011
The Vacuum Society of Japan
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Details 詳細情報について
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- CRID
- 1390001205295774464
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- NII Article ID
- 10027869947
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- NII Book ID
- AN00119871
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- ISSN
- 18824749
- 18822398
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- NDL BIB ID
- 11029532
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed