書誌事項
- タイトル別名
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- Development and New Technology of Sputtering System for Large Size Substrate
- オオガタ ガラス キバン エ ノ スパッタリング ソウチ ノ ハッテン ト シンギジュツ
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説明
ULVAC has maintained a leading share in the market of sputtering deposition systems for liquid crystal display (LCD) production since 1990, when LCD market started its rapid growth. These systems are used to prepare TFT-array and transparent conductive oxide (TCO) layers in LCD. This document describes the features of our sputtering system and especially focuses on the change in design concept of the system at the Gen. 7 substrate which aimed to achieve the demands for “Simple, Small-footprint and high-productivity”. A total package we propose for the sputtering deposition production, including the target material supply and the system maintenance, is also presented. Finally, recently proposed new materials for TFT are introduced: IGZO, a high mobility TCO material, and Cu alloys for low resistivity wiring.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 54 (2), 92-96, 2011
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001205295774464
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- NII論文ID
- 10027869947
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- NII書誌ID
- AN00119871
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 11029532
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
