Recent Progress of Highly Sensitive Photo-Polymerization Initiation
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- Aoai Toshiaki
- Synthetic Organic Chemistry Laboratories, Research & Development Management Headquarters, FUJIFILM Corporation
Bibliographic Information
- Other Title
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- 高感度光重合開始系の最近の進歩
- コウカンド ヒカリ ジュウゴウ カイシケイ ノ サイキン ノ シンポ
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Abstract
A photopolymer material has been widely used in negative-type photosensitive composition (e.g. as a radical or an acid catalyzed polymerization). A large number of photo-initiator com-pounds for these compositions have been developed corresponding to many industrial demands such as coatings (overcoats, adhesives), graphic materials (printing plates, inks), electronic materi-als (printed circuit, micro-resist, color filter), and recording materials (holography). With recent development of light source especially for IR, Visible, and UV lasers, there is a growing interest to increase their photo-sensitivity. To perform much higher sensitivity, dye sensitizers are usually utilized in both radical and cationic photo-polymerization, and are elaborately designed in combi-nation of initiators. The dye sensitization is mainly classified into 1) electron transfer mechanism and 2) energy transfer mechanism. The dyes, therefore, are controlled and adjusted to their physi-cal properties such as wave length, redox potential, and excited energy level according to the mechanism. In this paper, the classification of these initiators/dye sensitizers and their character-istics are shortly described. Furthermore a few recent applications are introduced as an example of high sensitive material.
Journal
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- Journal of Synthetic Organic Chemistry, Japan
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Journal of Synthetic Organic Chemistry, Japan 66 (5), 458-467, 2008
The Society of Synthetic Organic Chemistry, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001205311860352
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- NII Article ID
- 10021175007
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- NII Book ID
- AN0024521X
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- COI
- 1:CAS:528:DC%2BD1cXmtVaqsbo%3D
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- ISSN
- 18836526
- 00379980
- http://id.crossref.org/issn/00379980
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- NDL BIB ID
- 9503955
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed