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Studies on Photodegradation of Fluorocarbon Resin Paint Films by ESR Spectrometer
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- TSUJITA Takahiro
- NOF Corporation, Totsuka Factory
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- SUZUKI Teiichi
- NOF Corporation, Totsuka Factory
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- SAGAWA Chiaki
- NOF Corporation, Totsuka Factory
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- OKAMOTO Shingo
- NOF Corporation, Totsuka Factory
Bibliographic Information
- Other Title
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- ESRによるフッ素樹脂塗膜の光劣化に関する研究
- ESR ニ ヨル フッソ ジュシ トマク ノ ヒカリ レッカ ニ カンスル ケ
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Description
The photodegradation mechanism of thermosetting fluorocarbon paint films (CTFE/vinylether and CTFE/vinylester types) was studied by using ESR (electron spin resonance) technique. Radicals with the hyperfine structures splitted to six lines were detected from paint films under UV irradiation at 77 K. After the films were irradiated with UV light under oxygen at room temperature, they were measured in liquid nitrogen at 77 K, from which peroxide radicals with 2. 034 of g_??_ and 2. 0066 of g⊥ were detected. To determine these radical species, various simulations were applied. From these results, it was considered that these radical species were<BR>-CF2CFCH2CH (OR) CF2- (Radical A) and<BR>-CF2CFClCH2C (OR) CF2- (Radical B), <BR>which were then converted to the peroxy radicals.
Journal
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- Journal of the Japan Society of Colour Material
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Journal of the Japan Society of Colour Material 67 (8), 484-488, 1994
Japan Society of Colour Material
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Keywords
Details 詳細情報について
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- CRID
- 1390001205469173248
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- NII Article ID
- 10007402588
- 10003126142
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- NII Book ID
- AN00354634
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- COI
- 1:CAS:528:DyaK2MXktlyksbk%3D
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- NDL BIB ID
- 3893750
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- ISSN
- 0010180X
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed