A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator

DOI

Bibliographic Information

Other Title
  • ネガ型感光性ポリチオフェンの開発

Abstract

Generally, a micro-patterned phlythiophenes is fabricated by a microcontact printing method. However, this method requires complicated operation resulting in low productivity. To overcome this problem, direct patterning on polythiophenes based on photolithographic method is highly required. In this work, the new negative-type photosensitive polythiophenes consisting of poly(3-hexylthiophene), a cross-linker and a photoacid generator have been developed.

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Keywords

Details 詳細情報について

  • CRID
    1390001205556492928
  • NII Article ID
    130005469864
  • DOI
    10.11486/ejisso.25.0_45
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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