Surface Finish of Thick Photo Resist and Nickel Electroplating Structure by Ultra-precision Cutting

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  • 厚膜フォトレジストおよびNiメッキ構造体の超精密切削による表面仕上げ
  • E.D.C.の構造設計への応用-1・2-
  • E.D.C. ノ コウゾウ セッケイ エ ノ オウヨウ 1 2

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Abstract

This paper deals with an experimental study on ultra–precision diamond cutting of thick photo resist after baking treatment or exposure and nickel electroplating structure. The purpose of this study is to obtain surface integrity and the flatness. In this study, it gives an assessment for roughness and finished surface character by ultra–precision diamond cutting, and proves possibility of multiplayer lithography process.

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