Study on Nano-Stereolithography Using Evanescent Wave (4th report)

DOI
  • Inazuki Yuichi
    東京大学　大学院工学系研究科　精密機械工学専攻
  • Kajihara Yusuke
    東京大学　大学院工学系研究科　精密機械工学専攻
  • Takahashi Satoru
    東京大学　大学院工学系研究科　精密機械工学専攻
  • Takamasu Kiyoshi
    東京大学　大学院工学系研究科　精密機械工学専攻

Bibliographic Information

Other Title
  • エバネッセント光を利用したナノ光造形法に関する研究(第4報)
  • 三次元造形における分解能制御の検討

Abstract

In recent years, the stereolithography that is one of the Rapid Prototyping technologies has attracted more attention. In this study, we propose a novel stereolithography method, in which the evanescent wave with higher resolution is used as the exposure energy and aim at establishing the nano-stereolithography with higher accuracy and flexibility. We demonstrated the feasibility of lithography with the resolution of 100 nm scale by using evanescent wave in previous reports. In this report, we make theoretical and experimental analyses about the resolution of this three-dimensional fabrication method and verify the validity of stereolithography using evanescent wave.

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Details 詳細情報について

  • CRID
    1390001205650105600
  • NII Article ID
    130004657419
  • DOI
    10.11522/pscjspe.2005s.0.25.0
  • Data Source
    • JaLC
    • CiNii Articles
    • KAKEN
  • Abstract License Flag
    Disallowed

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