Development of a novel double-sided polishing machine with high efficiency using a circular movement

DOI

Bibliographic Information

Other Title
  • 旋回運動を適用した新たな高能率両面研磨装置の開発（第1報）

Abstract

Authors have been developed a novel double-sided polishing machine with high efficiency for IT. This machine consists of upper, lower platens and a pallet for works. It has a new mechanism for high efficiency by circular moving each other, and production efficiency three times or more than the similar polishing area machine, because our machine has no rotating shaft. Therefore polishing area becomes larger than other type machine. And, the difference of peripheral speed is able to control the low level, since the work pieces do not turn on an axis, and we obtained good roughness and uniform surface was obtained on a sample glass substrate.

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Keywords

Details 詳細情報について

  • CRID
    1390001205652439168
  • NII Article ID
    130004658639
  • DOI
    10.11522/pscjspe.2008a.0.435.0
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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