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Pyrromethene Dye Sensitized Photopolymer and the Application to Visible Laser Direct Imaging
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- Suzuki Shota
- Chiba University
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- Urano Toshiyuki
- Mitsubishi Chemical
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- Hotta Iwao
- Kyowa Hakko
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- Murayama Toshikazu
- Kyowa Yuka
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- Ito Katsuhiro
- Kyowa Yuka
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- Miyagawa Nobukazu
- Chiba University
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- Takahara Shigeru
- Chiba University
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- Yamaoka Tsuguo
- Chiba University
Bibliographic Information
- Other Title
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- ピロメテン系増感色素のレーザーダイレクトイメージングへの応用
Description
We studied the various initiating systems that consist of sensitizing dyes and initiators such as photoacid generators and radical generators and found that the photopolymer consists of a pyrromethene sensitizing dye, a naphthalimide type photoacid generator, and a polymer bearing acetal group could exhibit a high photosensitivity by applying the chemical amplification mechanism. The sensitization mechanism in a polymer film was also studied by means of absorption and fluorescence spectrum, high performance liquid chromatography, and laser flash photolysis method, and then we applied the novel photopolymer to the Computer-to-Plate technology (CTP) and dry film resist for printed circuit board (PCB).
Journal
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- Abstracts of The Japanese Society of Printing Science and Technology's Spring and Fall Conferences
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Abstracts of The Japanese Society of Printing Science and Technology's Spring and Fall Conferences 111 (0), 7-7, 2003
The Japanese Society of Printing Science and Technology
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Details 詳細情報について
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- CRID
- 1390001205697915648
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- NII Article ID
- 130007018147
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed
