No.1-9 Reaction mechanism of nitric acid production from NOx by photochemical reaction
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- WAKAZONO Tomohito
- Gifu University
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- Ebata Satsuki
- Gifu University
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- HAYAKAWA Yukio
- Gifu University
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- KAMBARA Shinji
- Gifu University
Bibliographic Information
- Other Title
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- No.1-9 光反応による窒素酸化物から硝酸への転換機構
Abstract
<p>To remove nitric oxide (NO) in flue gas at low temperature, photochemical reaction using vacuum ultraviolet (VUV) was examined at room temperature. The wavelength of VUV was 172 nm. NO was converted to N2, NO2, and HNO3. The products were controlled by the gas residence time. NO removal was increased in an increase of the gas residence time, about 100% removal was attained at the gas flow rate of 1.0 L/min. At the flow rate of 5.0 L/min (short residence time), removed NO was mostly converted to HNO3 and NO2. Contrary, the amount of HNO3 and NO2 was a little at long gas residence time though NO removal was high. Reaction mechanism of NO removal by VUV irradiation was proposed.</p>
Journal
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- Proceedings of Conference on Coal Science
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Proceedings of Conference on Coal Science 54 (0), 18-19, 2017
The Japan Institute of Energy
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Details 詳細情報について
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- CRID
- 1390001205771503744
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- NII Article ID
- 130007044350
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- ISSN
- 24238309
- 24238295
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- Text Lang
- ja
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed