S051044 液晶性色素会合体の塗布過程における配向メカニズムの解明([S051-04]複雑流体の流動現象(4))

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タイトル別名
  • S051044 Mechanism of aggregate orientation on application process of chromonic liquid crystal

抄録

The flow near the free surface of the meniscus region behind an applicator in application process of a chromonic liquid crystal was investigated. In the case of the applicators that have a knife-edge shaped back wall, the velocity distribution on the surface of the meniscus region is not affected by the gap of the application area. In the case of the traditional shaped applicator, which has a back wall with about 50 degrees angle, the height of the wet line on the back wall of the applicator climbs up during application process and is closely related with the thickness of the dry thin film. The part near the back wall in the meniscus flows reversely and a stagnation line is formed on the surface of the meniscus.

収録刊行物

  • 年次大会

    年次大会 2013 (0), _S051044-1-_S051044-4, 2013

    一般社団法人 日本機械学会

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