Fabrication Technology of Autocloning for Photonic Crystals (<Special Issue>Photonic Crystals)
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- Kawashima Takayuki
- New Industry Hatchery Creation Center (NICHe), Tohoku University
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- Fujimura Atsushi
- Research Institute of Electrical Communication, Tohoku University
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- Sato Takashi
- Research Institute of Electrical Communication, Tohoku University
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- Kawakami Shojiro
- New Industry Hatchery Creation Center (NICHe), Tohoku University
Bibliographic Information
- Other Title
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- フォトニック結晶の自己クローニング法による作製技術(<小特集>フォトニック結晶)
- フォトニック結晶の自己クローニソグ法による作製技術
- フォトニック ケッショウ ノ ジコ クローニソグホウ ニ ヨル サクセイ ギジュツ
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Abstract
Autocloning is a reliable fabrication method for photonic crystals, which is based on stacking multilayers by sputter deposition and shaping by sputter etching. For we increase the freedom of the shaping process for unit cells ofthe autocloned photonic crystals, we have developed a new fabrication process by introducing reactive ion etching into autocloning. Utilizing the new process, we can fabricate a non layer-by-layer structure unlike usual autocloned structures. The new process leads to the development of new structures and new possibilities of autocloning. In this paper, we report the details of the process, the new structures, and its applications.
Journal
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- Journal of the Japanese Association for Crystal Growth
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Journal of the Japanese Association for Crystal Growth 28 (1), 13-18, 2001
The Japanese Association for Crystal Growth
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Details 詳細情報について
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- CRID
- 1390001205862587008
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- NII Article ID
- 110002715447
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- NII Book ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- NDL BIB ID
- 5726897
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed