OS1311 Quantitative characterization of crystallinity of grain boundaries in nano-scale and its application to the strength evaluation of polycrystalline thin films

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  • MURATA Naokazu
    Tohoku University, Dept. of Nanomechanics, Graduate School of Engineering
  • SAITO Naoki
    東北大学大学院工学研究科ナノメカニクス専攻
  • SUZUKI Ken
    東北大学エネルギー安全科学国際研究センター
  • MIURA Hideo
    東北大学エネルギー安全科学国際研究センター

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Other Title
  • OS1311 ナノ結晶粒界品質評価手法の開発と薄膜多結晶材料への適用

Description

A novel evaluation method of the crystallinity of grains and grain boundaries was proposed by analyzing the quality of Kikuchi lines obtained from the conventional EBSD analysis. This method can evaluate the porous and brittle grain boundaries by IQ (Image Quality) and CI (Confidence Index) . Both IQ and CI values are the parameters which are calculated from the observed result of the Kikuchi pattern obtained from the area where electron beams penetrate during EBSD analysis. The position of the grain boundaries is determined by this CI value, and the crystallinity of the film around the grain boundaries is evaluated by the IQ value quantitatively.

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