書誌事項
- タイトル別名
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- C133 Evaporation Characteristics of an Ultra Thin Liquid Film on a Solid Surface
抄録
Experimental study on evaporation of thin liquid film has been conducted to understand the molecular-scale transport phenomena at liquid-vapor interface. The Fizeau interference method was utilized for transient measurements of the thickness of liquid film on hydrophilic surface. A thin-film thermocouple made of copper and nickel was also formed on the surface of silicon wafer for a direct measurement of solid surface temperature. The optical measurements show that the evaporation rate increases with the decrease of film thickness and have a possibility of better evaluation of the condensation coefficient.
収録刊行物
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- 熱工学コンファレンス講演論文集
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熱工学コンファレンス講演論文集 2005 (0), 113-114, 2005
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390001205879909504
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- NII論文ID
- 110006206676
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- ISSN
- 2424290X
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可