Powder Jet Deposition of Ceramic Films(M^4 processes and micro-manufacturing for science)
-
- YOSHIHARA Nobuhito
- Department of Nanomechanics, Tohoku University
-
- KURIYAGAWA Tsunemoto
- Department of Nanomechanics, Tohoku University
-
- YASUTOMI Yuya
- Department of Nanomechanics, Tohoku University
-
- OGAWA Kazuhiro
- Fracture and Reliability Research Institute, Tohoku University
説明
Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.
収録刊行物
-
- Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
-
Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 2005.2 (0), 833-838, 2005
一般社団法人 日本機械学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001205900844032
-
- NII論文ID
- 110006185801
-
- ISSN
- 24243086
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
-
- 抄録ライセンスフラグ
- 使用不可