書誌事項
- タイトル別名
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- 5503 Patterning of organic resist using a knife form probe
抄録
This report describes results of resist patterning using a knife edge probe we have developed recently. Nano patterning using atomic force microscope is usually done by field assisted oxidation technique. This method provides very small patterning but patterned layer is very thin and limited for only oxidizable materials. Therefore we applied for resist patterning directly by AFM using the knife edge probe. The patterning was done by tapping mode of AFM which carve a photo resist. The fabricated pattern was then transformed to aluminum under layer which is used as a mask for ICP RIE. Using this method we have obtained very small trench structure in width of 430nm.
収録刊行物
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- 年次大会講演論文集
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年次大会講演論文集 2006.7 (0), 291-292, 2006
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390001206063942784
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- NII論文ID
- 110006635986
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- ISSN
- 24331325
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可