Homogeneous Thermal Oxidation of Acetone Behind Reflected Shock Wave.

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  • 反射衝撃波背後におけるアセトンの均一相熱酸化機構
  • ハンシャ ショウゲキハ ハイゴ ニ オケル アセトン ノ キンイツソウ ネツ サンカ キコウ

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Abstract

The thermal oxidation of acetone mixture, highly diluted with argon, has been observed in the mixtures of 0.02-0.5% acetone and 0.04-10% oxygen using UV absorption and IR emission. The experiments were performed behind reflected shock wave at temperatures 1200 1700K and at densities (2-9)×(10)5mol/cm3. The time histories of absorption intensity at 270nm and emission at 3.4μm due to CH3COCH3, absorption intensity at 310nm due to OH, emission intensity at 4.2μm due to CO2, and emission intensity at 4.7μm due to CO and CO2 were followed. The oxidation scheme CH3COCH3⇾CH3CO⇾CH3⇾(C2H6)⇾C2H4⇾CH2O (H2C2O)⇾CO⇾CO2- was obtained by comparing the experimental profiles with the profiles of computer simulation. The rate of acetone decomposition influenced the induction period of the oxidation.

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