In Situ Mass and Photoemission Studies of Fluorinated Polyimide Films Irradiated with an Electron Beam.
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- Yamada–Maruo Yasuko
- NTT Interdisciplinary Research Laboratories, Musashino, Tokyo 180, Japan
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- Sasaki Shigekuni
- NTT Interdisciplinary Research Laboratories, Musashino, Tokyo 180, Japan
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- Tamamura Toshiaki
- NTT Opto–electronics Laboratories, Atsugi, Kanagawa 243–01, Japan
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説明
Fluorinated polyimide films were irradiated in an ultrahigh vacuum with an electron beam. In situ mass analysis was carried out simultaneously and in situ photoemission studies were performed on surfaces modified by electron exposure at various electron beam energies and various sample currents. Based on the present data, the irradiation of electrons produces a fluorine-poor surface and an imide-ring opening, and the production rate was accelerated by raising the electron beam energy. An electron beam with low energy and low density is effective for changing the refractive index of the surface of fluorinated polyimide films with small strength change.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 35 (4B), L523-L525, 1996
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206245082624
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- NII論文ID
- 110003925090
- 210000040541
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可