Printing Sub-100 Nanometer Features Near-field Photolithography.
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- Tanaka Shuji
- Department of Engineering Synthesis, Faculty of Engineering, The University of Tokyo, 7–3–1 Hongo, Bunkyo–ku, Tokyo 113–8656, Japan
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- Nakao Masayuki
- Department of Engineering Synthesis, Faculty of Engineering, The University of Tokyo, 7–3–1 Hongo, Bunkyo–ku, Tokyo 113–8656, Japan
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- Hatamura Yotaro
- Department of Engineering Synthesis, Faculty of Engineering, The University of Tokyo, 7–3–1 Hongo, Bunkyo–ku, Tokyo 113–8656, Japan
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- Komuro Masanori
- Electrotechnical Laboratory, Ministry of International Trade and Industry, 1–1–4 Umezono, Tsukuba, Ibaragi 305–8568, Japan
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- Hiroshima Hiroshi
- Electrotechnical Laboratory, Ministry of International Trade and Industry, 1–1–4 Umezono, Tsukuba, Ibaragi 305–8568, Japan
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- Hatakeyama Masahiro
- Ebara Research Co., Ltd., 4–2–1 Honfujisawa, Fujisawa, Kanagawa 251–8502, Japan
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Abstract
In this paper, a near-field photolithographic method which can realize ultra high resolution beyond the diffraction limit of light is described. Evanescent light generated on a transparent mold with a micro-relief illuminated on the condition of total internal reflection is used to expose a photoresist in contact with the mold. The plastic replica mold is flexible to eliminate the difficulty of close contact with the photoresist, and the replica mold damaged by the contact with the photoresist is disposable to maintain a high yield rate. We printed sub-100 nm features on a commercially available photoresist using 442-nm-wavelength light.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 37 (12B), 6739-6744, 1998
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390001206249644800
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- NII Article ID
- 210000044040
- 30021830943
- 110003947256
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 973537
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed