Temperature-Corrected Quartz-Crystal Microbalance for Real-Time Film Thickness Monitoring in Vacuum Evaporation.
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- Yamamoto Hideki
- Department of Electronic Control Engineering, Yonago National College of Technology, 4448 Hikona, Yonago, Tottori 683, Japan
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- Saiga Noriaki
- Department of Electronic Control Engineering, Yonago National College of Technology, 4448 Hikona, Yonago, Tottori 683, Japan
書誌事項
- タイトル別名
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- Temperature-Corrected Quartz-Crystal Mi
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抄録
For a quartz-crystal microbalance system without thermocouples for monitoring thin film thickness, a computational method which corrects for the temperature variation in the quartz crystal is presented. This correction method eliminates the need for pipes and electrical wires, simplifying the conventional system. To avoid the use of electrical wires, both a laser diode and a microlens were used to transmit the signal of the change of resonant frequency of the quartz crystal. Using a 4.2 MHz resonant AT-cut quartz-crystal plate, the error in the measurement of Ti film thickness was <3.0% under the conditions of deposition time <230 s and the quartz-crystal temperature <160° C.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 35 (9A), 4833-4838, 1996
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206250102400
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- NII論文ID
- 10004613635
- 130004522840
- 210000039705
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4060178
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可