A Theoretical Investigation of the Epitaxial Relationship of NiAl/AlAs.
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- Ito Tomonori
- NTT LSI Laboratories, 3–1 Morinosato Wakamiya, Atsugi–shi, Kanagawa 243–01, Japan
書誌事項
- タイトル別名
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- Theoretical Investigation of the Epitax
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抄録
The epitaxial relationship between NiAl and AlAs is investigated theoretically, using cohesive energy calculations based on empirical interatomic potentials. We consider various systems such as NiAl(001) on AlAs(001), and AlAs(001) and AlAs(111) on NiAl(001) with interface atom pairs including As/Ni, Al/Ni, As/Al and Al/Al. The calculated results for NiAl(001) on AlAs(001) imply that the formation of a Ni atomic layer at the interface can stabilize NiAl(001). In AlAs on NiAl(001), Al/Ni and As/Ni interfaces favor AlAs(001), whereas AlAs(111) is relatively stable in As/Al and Al/Al interfaces. These findings are qualitatively consistent with experimental results.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 35 (8B), L1035-L1037, 1996
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206250692096
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- NII論文ID
- 210000040202
- 110003925242
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4060108
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可