Formation of Two-Dimensional Network Structure of DNA Molecules on Si Substrate.
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- Tanaka Shin-ichi
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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- Cai Lin-Tao
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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- Tabata Hitoshi
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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- Kawai Tomoji
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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抄録
We have succeeded in attaching deoxyribo nucleic acid (DNA) molecules to a semiconducting Si substrate by adding MgCl2 to the DNA solution. The optimum concentration of MgCl2 solution to form the DNA network structure is 0.05 to 0.5 mM. Furthermore, it is found that DNA molecules attach to a hydrophilic SiO2 surface but not to a hydrophobic SiH surface. This result indicates that it is possible to fabricate micropatterning on a Si surface by using a DNA template and photolithography.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 40 (4B), L407-L409, 2001
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206253572736
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- NII論文ID
- 210000050690
- 110004085531
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- NII書誌ID
- AA10650595
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- COI
- 1:CAS:528:DC%2BD3MXjtFOnuro%3D
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 5762509
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可