Direct Measurement of Sheath Electric Field Distribution in Front of Substrate in Electron Cyclotron Resonance Plasma by Laser-Induced Fluorescence Technique.

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  • Watanabe Mahiko
    Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University,<BR> 1-4-1, Kagamiyama, Higashi-Hiroshima 739-8527, Japan
  • Takiyama Ken
    Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University,<BR> 1-4-1, Kagamiyama, Higashi-Hiroshima 739-8527, Japan
  • Oda Toshiatsu
    Faculty of Engineering, Hiroshima Kokusai Gakuin University, Nakano, Aki-ku, Hiroshima 739-0321, Japan

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Abstract

The first reported direct measurement of a sheath electric field structure was made in front of a substrate in an electron cyclotron resonance plasma flow in a magnetic field using polarized laser-induced fluorescence spectroscopy. A linear decrease of the electric field strength was found relative to the distance from the substrate surface. The sheath thickness was proportional to the square root of the applied bias voltage. The experimental results can be explained by a simple sheath model.

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