Structure and Electrical Studies of Fluorinated Amorphous Carbon Films Prepared by Electron Cyclotron Resonance/Chemical-Vapor Deposition

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  • Huang Kun Ping
    Department of Materials Science and Engineering, National Chiao-Tung University
  • Lin Pang
    Department of Materials Science and Engineering, National Chiao-Tung University
  • Shih Han C.
    Department of Materials Science and Engineering, National Tsing-Hua University

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Fluorinated amorphous carbon (a-C:F) films of high fluorine content were prepared by radio-frequency (RF) bias assisted electron cyclotron resonance/chemical-vapor deposition (ECR-CVD) with a variable fluorine-to-carbon (F/C) ratio of the feed gases. The films were characterized by X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS) and transmission electron microscopy (TEM). A low dielectric constant of around 1.5 and high dielectric strength beyond 35 MV/cm were obtained under the as-deposited and annealed conditions, respectively. The measured huge current surge and electrical conductivity of the films were discussed on the basis of the nanovoids and sp2/sp3 bonding fractions as derived from the above characterizations.

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