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Miniaturization of a Thermally Driven Ni|Si Bimorph
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- Tomonari Shigeaki
- Matsushita Electric Works, Ltd.
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- Yoshida Hitoshi
- Matsushita Electric Works, Ltd.
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- Kamakura Masanao
- Matsushita Electric Works, Ltd.
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- Yoshida Kazushi
- Matsushita Electric Works, Ltd.
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- Kawahito Keiko
- Matsushita Electric Works, Ltd.
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- Saitoh Masaaki
- Matsushita Electric Works, Ltd.
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- Kawada Hiroshi
- Matsushita Electric Works, Ltd.
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- Juodkazis Saulius
- Department of Ecosystem Engineering, The University of Tokushima
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- Misawa Hiroaki
- Department of Ecosystem Engineering, The University of Tokushima
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Description
We report on the development of a thermally isolated bimorph structure based on a Ni|Si pair. A 1-mm-long beam of the bimorph was thermally isolated by a polyimide comb from the rest of the Si structure. The Si and Ni layers of the bimorph were 20 μm thick. This geometry enabled us to generate the bending displacement (the stroke) of the free end of the bimorph up to 100 μm at about 100°C with a generated force of about 15 mN. Electrical power consumption for the 100°C working point was lower than 0.2 W and the response time was 0.5 s. This design entitles further miniaturization of micro-electromechanical systems (MEMSs) such as commercial microvalve structures and sensors. The principles of design and experimental results of temperature distribution for the bimorph are presented and discussed.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 42 (7A), 4464-4468, 2003
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390001206255281152
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- NII Article ID
- 130004531053
- 10011259165
- 210000053826
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 6604995
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed