Miniaturization of a Thermally Driven Ni|Si Bimorph

この論文をさがす

説明

We report on the development of a thermally isolated bimorph structure based on a Ni|Si pair. A 1-mm-long beam of the bimorph was thermally isolated by a polyimide comb from the rest of the Si structure. The Si and Ni layers of the bimorph were 20 μm thick. This geometry enabled us to generate the bending displacement (the stroke) of the free end of the bimorph up to 100 μm at about 100°C with a generated force of about 15 mN. Electrical power consumption for the 100°C working point was lower than 0.2 W and the response time was 0.5 s. This design entitles further miniaturization of micro-electromechanical systems (MEMSs) such as commercial microvalve structures and sensors. The principles of design and experimental results of temperature distribution for the bimorph are presented and discussed.

収録刊行物

被引用文献 (2)*注記

もっと見る

参考文献 (17)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ