Evaluation of Band-Gap Energies and Characterization of Nonradiative Recombination Centers of Film and Bulk GaN Crystals
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- Kamano Masaru
- Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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- Haraguchi Masanobu
- Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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- Fukui Masuo
- Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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- Kuwahara Minoru
- Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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- Okamoto Toshihiro
- Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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- Mukai Takashi
- Department of Research and Development, Nichia Chemical Industries, Ltd.
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- Shinomiya Genichi
- Department of Research and Development, Nichia Chemical Industries, Ltd.
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Description
We have measured photothermal spectra of bulk and film GaN crystals by the photothermal divergence (PTD) method in the temperature range from 110 K to 320 K. The band-gap energy of the GaN film grown by metalorganic chemical vapor deposition (MOCVD) method on a sapphire substrate shifts toward a higher energy because of the stress, compared with that of the bulk GaN grown by hydride vapor-phase epitaxy (HVPE) method. Moreover, the dependence of the PTD signal intensity, IPTD, on the doping has been observed. From IPTD spectra, we have found that a doping procedure may induce the degradation of the crystalline quality of GaN. For the bulk, two peaks in the energy region below the band edge have been observed in the IPTD spectra, and it has been found that such peaks may originate in nonradiative recombination centers. The two peaks have been characterized to be related to deep levels observed previously by means of the so-called deep-level transient-scan method.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 42 (8), 4905-4908, 2003
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390001206256675584
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- NII Article ID
- 10011447219
- 210000053937
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 6652787
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed