Kinetics of TiN Chemical Vapor Deposition Process using TiCl<sub>4</sub>and NH<sub>3</sub>for ULSI Diffusion Barrier Applications: Relationship between Step Coverage and NH<sub>3</sub>Partial Pressure
-
- Jun Keeyoung
- Department of Materials Engineering, School of Engineering, The University of Tokyo
-
- Egashira Yasuyuki
- Division of Chemical Engineering, Department of Chemical Engineering, Osaka University
-
- Shimogaki Yukihiro
- Department of Materials Engineering, School of Engineering, The University of Tokyo
書誌事項
- タイトル別名
-
- Kinetics of TiN Chemical Vapor Deposition Process using TiCl4 and NH3 for ULSI Diffusion Barrier Applications: Relationship between Step Coverage and NH3 Partial Pressure
この論文をさがす
説明
TiN films were deposited by chemical vapor deposition (CVD) using NH3 and TiCl4 as the source precursors. The effect of partial pressures of TiCl4 (PTiCl<SUB>4</SUB>) and NH3 (PNH<SUB>3</SUB>) on the growth rate and step coverage quality of these TiN films was measured, revealing the growth rate of TiN films followed the Langmuir–Hinshelwood (L–H) type isotherm as a function of PTiCl<SUB>4</SUB>. The sticking probability of film-forming species was estimated from the step coverage profile simulated by using the Monte Carlo method. The relationship between the sticking probability of Ti-containing species and PNH<SUB>3</SUB> was investigated, revealing that the sticking probability in the 1st-order kinetic regime depended on PNH<SUB>3</SUB>. The effect of NH3 on the growth kinetics could be expressed by G.R.×ρTiN=[ksKCTiCl<SUB>4</SUB>⁄(1+KCTiCl<SUB>4</SUB>)]·(CNH<SUB>3</SUB>)2 in the wide range of PTiCl<SUB>4</SUB>. The reason for 2nd-order reaction for PNH<SUB>3</SUB> is not clear yet, but the rate equation suggests the complicated gas-phase and/or surface reaction chemistries to form TiN.
収録刊行物
-
- Japanese Journal of Applied Physics
-
Japanese Journal of Applied Physics 43 (10), 7287-7291, 2004
The Japan Society of Applied Physics
- Tweet
キーワード
詳細情報 詳細情報について
-
- CRID
- 1390001206263619456
-
- NII論文ID
- 10013746239
- 130004531426
- 210000056594
-
- NII書誌ID
- AA10457675
-
- ISSN
- 13474065
- 00214922
-
- NDL書誌ID
- 7124957
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可