Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition(Brief Communication)
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- Morita Takahiko
- University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
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- Kanda Kazuhiro
- University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
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- Haruyama Yuichi
- University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
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- Matsui Shinji
- University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
書誌事項
- タイトル別名
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- Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition
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説明
Focused-ion-beam chemical vapor deposition (FIB-CVD) is an excellent technology for forming a free-space-nanowiring. At 295 K the electrical resistivity of a free-space-nanowiring made using phenanthrene as the source gas was 1×102 Ω cm. Adding tungsten hexacarbonyl to the phenanthrene reduced the electrical resistivity to 2×10−2 Ω cm. The nanomechanical switch composed of a coil and a nanowiring has been fabricated by using free-space-nanowiring fabrication technology, and its operation has been confirmed by applying a voltage.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (5A), 3341-3343, 2005
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206263897344
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- NII論文ID
- 10015707619
- 130004533906
- 210000057963
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 7311757
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- 本文言語コード
- en
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