Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition(Brief Communication)

  • Morita Takahiko
    University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
  • Kanda Kazuhiro
    University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
  • Haruyama Yuichi
    University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building
  • Matsui Shinji
    University of Hyogo, Graduate School of Science, LASTI CREST JST, Japan Science and Technology Co., Kawaguchi Center Building

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タイトル別名
  • Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition

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説明

Focused-ion-beam chemical vapor deposition (FIB-CVD) is an excellent technology for forming a free-space-nanowiring. At 295 K the electrical resistivity of a free-space-nanowiring made using phenanthrene as the source gas was 1×102 Ω cm. Adding tungsten hexacarbonyl to the phenanthrene reduced the electrical resistivity to 2×10−2 Ω cm. The nanomechanical switch composed of a coil and a nanowiring has been fabricated by using free-space-nanowiring fabrication technology, and its operation has been confirmed by applying a voltage.

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