Improvement of Electron Beam Mastering Using Dry Etching Process
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- Kasono Osamu
- Corporate Research and Development Laboratories, PIONEER Corporation
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- Sato Megumi
- Corporate Research and Development Laboratories, PIONEER Corporation
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- Sugimoto Tatsuya
- PDP Development Center, PIONEER Corporation
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- Kojima Yoshiaki
- Corporate Research and Development Laboratories, PIONEER Corporation
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- Katsumura Masahiro
- Corporate Research and Development Laboratories, PIONEER Corporation
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説明
We have developed an electron beam recorder and utilized it in high-density disk mastering. We discussed an electron scattering in disk mastering that degrades the reproduction performance of disks. In order to improve the reproduction performance, we applied a dry etching process to the disk mastering process, and confirmed its efficacy in reducing the scattering effect and improving disk noise by calculation and experiments. We fabricated ‘Blu-ray Disc’-type read-only memory disks with and without the dry etching process, and noticed the advantage of the dry etching process from the jitter comparison. Finally, a 4.7% jitter was achieved in a 25 GB capacity disk, while a 5.7% jitter was obtained in a 27 GB capacity disk with additional recording compensation.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 43 (7B), 5078-5084, 2004
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206263926400
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- NII論文ID
- 10013432737
- 30021855393
- 130004532598
- 210000056094
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 7030256
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDLサーチ
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