A Novel Low Temperature Curable Photosensitive Polybenzoxazole

DOI Web Site 被引用文献4件 参考文献44件
  • Toyokawa Fumihiro
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Shibasaki Yuji
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Ueda Mitsuru
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

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タイトル別名
  • Novel Low Temperature Curable Photosensitive Polybenzoxazole

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説明

A novel positive-tone photosensitive polybenzoxazole for low temperature cyclization has been developed. The matrix polymer (PHA-6F) was prepared from 4,4′-(hexafluoroisopropylidene)bis(o-aminophenol) (6FAP) and 4,4′-oxybis(benzoyl chloride) (OBBC) by low temperature solution polycondensation, and the photosensitive polymer was formulated with PHA-6F, a dissolution inhibitor 1-{1,1-bis[4-(2-diazo-1-(2H)naphthalenone-4-sulfonyloxy)phenyl]ethyl}-4-{1-[4-(2-diazo-1(2H)naphthalenone-4-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ), and a photo- and thermoacid generator (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-2-(methylphenyl)acetonitrile (PTMA). The photosensitivity and contrast of the 2.4 μm thick film were 15 mJ/cm2 and 2.5, respectively. A clear positive polybenzoxazole image featuring 8 μm line-and-space pattern was obtained, when a 2.1 μm-photosensitive film containing PHA-6F, S-DNQ, and PTMA (15:3:2 in weight ratio) was prebaked at 120 °C for 5 min, irradiated with 365 nm light (60 mJ/cm2), developed with an 2.38 wt % tetramethylammonium hydroxide (TMAH) solution for 90 s, washed with acetic acid, and cured at 250 °C for 10 min.

収録刊行物

  • Polymer Journal

    Polymer Journal 37 (7), 517-521, 2005

    The Society of Polymer Science, Japan

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