プラズマジェットＣＶＤダイヤモンド膜形成におよぼす非ダイヤモンド質の影響

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  • Effect of Non-diamond Material on the Diamond Film Formation by Plasma Jet CVD.
  • プラズマ ジェット CVD ダイヤモンド マク ケイセイ ニ オヨボス ヒ ダ

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A chemical vapour deposited diamond film was grown on a SiC substrate by the plasma arcjet method. The deposited film was circular and appeared to be radially zoned by visual examination. Hicrofocus Raman spectroscopy was used to examine the radial compositional variation of the film and SEM was used to examine the surface morphologies corresponding to the various zones. Raman spectra showed that the composition varied from graphite to diamond while being hydrogenated carbon. SEM observation showed that amorphous carbon was hydrogenated into hydric carbon, and that included a microcrystalline diamond and prevented the growth of the diamond. As a result, a microcrystalline diamond film zone was produced between graphite zone and polycrystalline diamond zone. The structure and indentation hardness of the microcrystalline diamond film were investigated by TEN observation and micro-Vickers, and also the effect of the microcrystalline diamond film on the overlaped diamond film was investigated by SEM, XRD, Raman spectroscopy. The results were as follows.<BR>(1) The hydric carbon in microcrystalline diamond film looked the matrix material that surrounded the single crystalline diamond of 10-20nm size by TEN bright-fild image and TED pattern.<BR>(2) The micro-Vickers hardness of the microcrystalline diamond film was 82 GPa with a load of 9.8N at room temperature. The indentation was characteristic of amorphous structure.<BR>(3) The overlaped diamond film on the microcrystalline diamond film layer exhibited flat surface and good crystallinity.

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