書誌事項
- タイトル別名
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- Synthesis of Photo-curable Borosilicate Thin-film Material and Fabrication of Microstructure
- ヒカリ コウカセイ ホウケイ サンエンケイ ハクマク ザイリョウ ノ サクセイ ト ビサイ コウゾウ ケイセイ
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抄録
Photo-curable organoborosilicate glasses were synthesized through a catalyst- and solvent-free and non-aqueous alcohol condensation process at low temperature below 100°C. Formation of Si-O-B linkage was confirmed by IR spectra. After irradiation of UV-light, we have successfully cured the prepolymer coatings into prepared transparent and homogeneous thin film. A refractive index of the thin film of B(OH)3: 3-Methacryloxypropyltrimethoxysilane=1:1 composition was measured by a prism coupling method n=1.515 at 633 nm. Moreover, pencil hardnesses according to JIS5400 of photo-cured thin film before and after heat treatment at 550°C were 6H and over 10H, respectively. We demonstrated fabrication of microstructures on transparent thin film by embossing process followed by photo curing.
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 57 (7), 537-541, 2010
一般社団法人 粉体粉末冶金協会
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詳細情報 詳細情報について
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- CRID
- 1390001206307588608
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- NII論文ID
- 10026872144
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- NII書誌ID
- AN00222724
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- COI
- 1:CAS:528:DC%2BC3cXpslOgs74%3D
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 10782764
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可