書誌事項
- タイトル別名
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- Formation of Zirconia Films by the Aerosol Gas Deposition Method (By Jetting of Positive Charged Powder)
- エアロゾルカ ガスデポジションホウ ニ ヨル ジルコニア マク ノ ケイセイ カデン リュウシ ノ フンシャ ニ ヨル
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説明
The aerosol gas deposition method (AGD) is a low temperature method. No heating procedure exists in the AGD process during the formation of the AGD films. We can form even ceramic films by using AGD method. However, the mechanism of synthesizing ceramic film has not been made clear until now. This paper is the first trial to clarify the mechanism by using two kinds of zirconia powder. The experimental results indicated that in wet type zirconia powder the film could be formed in the limited conditions of diameter and the specific surface area of powders although in dry-milled zirconia powder all powders used could form the films. At the same experiments we observed the high temperature phase of zirconia in the film and a light emission phenomenon at the deposition site during AGD process. In this paper, we discuss the formation mechanism of the AGD film at the ambient temperature correlating with the film formation condition, the appearance of the high temperature phase and the light emission.
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 58 (8), 463-472, 2011
一般社団法人 粉体粉末冶金協会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001206311087488
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- NII論文ID
- 10029617339
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- NII書誌ID
- AN00222724
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- COI
- 1:CAS:528:DC%2BC3MXht1Sks77P
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 11215765
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
