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- KOBAYASHI Kenzo
- Department of Chemistry, Faculty of Science and Technology, Keio University
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- SHIMIZU Ken-ichi
- Department of Chemistry, Faculty of Science and Technology, Keio University
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- TSUDA Yoshihiro
- Department of Chemistry, Faculty of Science and Technology, Keio University
Bibliographic Information
- Other Title
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- Al‐Si合金表面に形成されるポーラス型アノード酸化皮膜の構造
- Al Si ゴウキン ヒョウメン ニ ケイセイサレル ポーラスガタ アノード
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Abstract
The structure of porous anodic films formed on Al-0.5%Si alloys were examined by transmission electron microscopy of ultramicrotomed sections with special attention to the behavior of Si precipitates during anodic oxidation. Si precipitates are incorporated into the porous anodic film growing over aluminum matrix surrounding the precipitates. Incorporation of Si precipitates proceeds in such a manner that the pores in the porous film growing over the aluminum matrix branch to undercut aluminum beneath the precipitates. Some of the branched pores develop even in the direction parallel to the metal surface.
Journal
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- Journal of Japan Institute of Light Metals
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Journal of Japan Institute of Light Metals 37 (12), 807-810, 1987
The Japan Institute of Light Metals
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Keywords
Details 詳細情報について
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- CRID
- 1390001206339940608
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- NII Article ID
- 130004208672
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- NII Book ID
- AN00069773
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- ISSN
- 18808018
- 04515994
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- NDL BIB ID
- 3157747
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed