Effect of high-frequency switching electrolysis on film thickness uniformity of anodic oxide film formed on AC8A Aluminum alloy
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- Yamamoto Tomoharu
- Department of Development, Suzuki Motor Corporation
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- Tanaka Hiroomi
- Department of Development, Suzuki Motor Corporation
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- Fujita Masahiro
- Department of Development, Suzuki Motor Corporation
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- Asoh Hidetaka
- Department of Applied Chemistry, Faculty of Engineering, Kogakuin University
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- Ono Sachiko
- Department of Applied Chemistry, Faculty of Engineering, Kogakuin University
Bibliographic Information
- Other Title
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- AC8Aアルミニウム合金におけるアノード酸化皮膜の皮膜厚さ均一化に対する高周波スイッチング電解の効果
- AC8A アルミニウム ゴウキン ニ オケル アノード サンカ ヒマク ノ ヒマク アツサ キンイツカ ニ タイスル コウシュウハ スイッチング デンカイ ノ コウカ
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Abstract
The effect of high-frequency switching electrolysis on the film thickness uniformity of an anodic oxide film formed on Al–Si (AC8A) alloy was studied. The film thickness uniformity was successfully improved by applying high-frequency switching electrolysis with positive and negative voltage cycles and not by direct current anodizing. To attain uniform film growth on an Al–Si substrate with substantial dispersion of crystallized Si particles, the effects of the applied time Ta at a positive voltage as well as of the shape of current waves on film morphology and film thickness uniformity was investigated. When Ta was set close to the time at which the current peak, Tp was observed, the most uniform film growth was achieved. This was explained by the capsulation of Si particles by intermittent oxide growth accompanied by switching electrolysis with appropriate applied intervals. The mechanism of uniform film growth was further interpreted using equivalent circuit models.
Journal
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- Journal of Japan Institute of Light Metals
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Journal of Japan Institute of Light Metals 60 (11), 602-607, 2010
The Japan Institute of Light Metals
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Details 詳細情報について
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- CRID
- 1390001206340513024
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- NII Article ID
- 130004774932
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- NII Book ID
- AN00069773
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- ISSN
- 18808018
- 04515994
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- NDL BIB ID
- 10893360
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed