ナシ黒星病菌のチオファネートメチル剤およびベノミル剤に対する耐性

DOI

書誌事項

タイトル別名
  • Resistance of Venturia nashicola to thiophanate-methyl and benomyl: Formation of the perfect state in culture and its application to genetic analysis of the resistance.
  • Formation of the Perfect State in Culture and its Application to Genetic Analysis of the Resistance

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抄録

Mature ascospores of the pear scab fungus Venturia nashicola were produced when mycelial suspensions of two compatible isolates were mixed on the culture media employed and incubated at 5C in the dark for about six months. The inheritance of resistance to thiophanate-methyl, benomyl and MBC was demonstrated experimentally using a technique developed for the production of ascospores. Progeny segregation of the cross between the resistant isolate and the sensitive one fitted a 1:1 ratio, indicating that resistance is under control of a major gene. Additional crosses among resistant isolates suggest the involvement of multiple major genes for different degrees of resistance.

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詳細情報 詳細情報について

  • CRID
    1390001206403762432
  • NII論文ID
    130003749756
  • NII書誌ID
    AN0019269X
  • DOI
    10.3186/jjphytopath.49.153
  • ISSN
    18820484
    00319473
  • 本文言語コード
    en
  • データソース種別
    • JaLC
    • Crossref
    • CiNii Articles
  • 抄録ライセンスフラグ
    使用不可

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