Characterising the Radio Frequency Plasma Source for Glow Discharge Optical Emission Spectroscopy.
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- Payling Richard
- Department of Physics, University of Newcastle
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- Chapon Patrick
- Jobin-Yvon Emission Horiba Group
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- Bonnot Olivier
- Jobin-Yvon Emission Horiba Group
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- Belenguer Philippe
- CPAT
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- Guillot Philippe
- CPAT
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- Pitchford Leanne C.
- CPAT
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- Therese Laurent
- CPAT
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- Michler Johann
- Swiss Federal Laboratories for Materials Testing and Research (EMPA)
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- Aeberhard Max
- Swiss Federal Laboratories for Materials Testing and Research (EMPA)
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説明
The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.
収録刊行物
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- ＩＳＩＪ Ｉｎｔｅｒｎａｔｉｏｎａｌ
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ＩＳＩＪ Ｉｎｔｅｒｎａｔｉｏｎａｌ 42 (Suppl), S101-S105, 2002
一般社団法人 日本鉄鋼協会
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詳細情報 詳細情報について
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- CRID
- 1390001206452746496
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- NII論文ID
- 10007817230
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- NII書誌ID
- AA10680712
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- ISSN
- 13475460
- 09151559
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
