アルゴンスパッタリングを用いた白雲母のＸＰＳ深さ方向分析

DOI Web Site

書誌事項

タイトル別名
  • XPS Depth Profile of Mica Using Argon Sputtering.

説明

The depth profiles of natural mica were determined by XPS using Ar+ sputtering. The localities and the chemical states of the atoms were studied under proper analysis conditions. The Ar+ beam with an energy of 1 keV was used to make the sputter rate slow enough. A low take-off angle (20 degrees) was used to obtain a fine resolution of the depth profiles. As a result, the periodic variations in atomic concentration were observed at the peaks; O(1 s), Si(2 p), Mg (2 p), and K(2 p). The variations indicate periodic stacking of sheets; tetrahedral sheet, octahedral sheet, and interlayer cations. A periodic variation in the Al(2 p) binding energy in the range of 74.20 to 74.28eV was observed, and it suggests that the tetrahedral Al and the octahedral Al atoms existed alternately in the crystal structure along with an axis perpendicular to the surface.

収録刊行物

  • 表面科学

    表面科学 19 (12), 826-830, 1998

    公益社団法人 日本表面科学会

詳細情報 詳細情報について

問題の指摘

ページトップへ