Recent Progress in Cluster Ion Beam Technology

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  • MATSUO Jiro
    Kyoto University, Quantum Science and Engineering Center CREST, Japan Science and Technology Agency
  • SEKI Toshio
    CREST, Japan Science and Technology Agency Kyoto University, Department of Nuclear Engineering
  • AOKI Takaaki
    CREST, Japan Science and Technology Agency Kyoto University, Department of Electric Science and Engineering

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Other Title
  • クラスターイオンビーム技術の最近の進展
  • クラスターイオンビーム ギジュツ ノ サイキン ノ シンテン

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Abstract

A brief overview for recent progress of cluster ion beams is presented in conjunction with atomistic collision dynamics, cluster size effects and nano-process developments. Unique characteristics of cluster ion beam are utilized not only for nano-processing but also metrology for organic materials. Molecular dynamics study on cluster-solid interactions and size dependence of sputtering with Ar or Cl2 cluster ions reveal that both incident energy and chemical potential energy are effectively transfer to the surface to enhance the sputtering yield. In addition to these, less damage was remained on organic surface bombarded with cluster ions. Organic depth profiling of XPS or SIMS are realized with cluster ion beams.

Journal

  • Hyomen Kagaku

    Hyomen Kagaku 31 (11), 564-571, 2010

    The Surface Science Society of Japan

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