書誌事項
- タイトル別名
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- Arrangement of Catalyst Islands at Surface Atomic Steps toward Position Control of Nanowires
説明
Using low-energy electron microscopy we show that Au deposition leads to the arrangement of three-dimensional islands at surface atomic steps on Si(111). Because the islands nucleate within a narrow coverage window, they have a small size distribution and their size can be precisely controlled by the deposition time. During the Au deposition on the surface with a controlled island density, the islands move into upper terraces with trenches left behind. This indicates that the islands are Au-Si alloy droplets. The Au-Si alloy islands act as catalysts for the nanowire formation based on the vapor-liquid-solid (VLS) mechanism, which enables us to fabricate the one-dimensional alignment of vertical GaP nanowires. Controlling the size and position of the nanostructures by using surface atomic steps as templates means “top-down” lithographic techniques are not needed. Our method is a pure “bottom-up” self-assembly one and is expected to greatly contribute to establishing self-assembled nano-device fabrication methods.
収録刊行物
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- 表面科学
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表面科学 27 (12), 688-694, 2006
公益社団法人 日本表面科学会
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詳細情報 詳細情報について
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- CRID
- 1390001206457920640
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- NII論文ID
- 130004486306
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- ISSN
- 18814743
- 03885321
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
