Arrangement of Catalyst Islands at Surface Atomic Steps toward Position Control of Nanowires

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Bibliographic Information

Other Title
  • 「半導体の表面・欠陥・ナノ構造の制御とその物性」ナノワイヤの配列制御に向けた触媒金属の表面原子ステップへの配置
Published
2006
DOI
  • 10.1380/jsssj.27.688
Publisher
The Surface Science Society of Japan

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Description

Using low-energy electron microscopy we show that Au deposition leads to the arrangement of three-dimensional islands at surface atomic steps on Si(111). Because the islands nucleate within a narrow coverage window, they have a small size distribution and their size can be precisely controlled by the deposition time. During the Au deposition on the surface with a controlled island density, the islands move into upper terraces with trenches left behind. This indicates that the islands are Au-Si alloy droplets. The Au-Si alloy islands act as catalysts for the nanowire formation based on the vapor-liquid-solid (VLS) mechanism, which enables us to fabricate the one-dimensional alignment of vertical GaP nanowires. Controlling the size and position of the nanostructures by using surface atomic steps as templates means “top-down” lithographic techniques are not needed. Our method is a pure “bottom-up” self-assembly one and is expected to greatly contribute to establishing self-assembled nano-device fabrication methods.

Journal

  • Hyomen Kagaku

    Hyomen Kagaku 27 (12), 688-694, 2006

    The Surface Science Society of Japan

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