GaAs Surface under Molecular-Beam Epitaxial Growth Conditions
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- TAKAHASI Masamitu
- Japan Atomic Energy Agency
Bibliographic Information
- Other Title
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- 結晶成長条件下におけるGaAs(001)表面構造
- ケッショウ セイチョウ ジョウケン カ ニ オケル GaAs(001)ヒョウメン コウゾウ
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Description
Surface sturctures of GaAs(001) under growth conditions have been investigated using in situ X-ray diffraction. Theatomic arrangements of GaAs(001) surface stabilized at an elevated temperature under As pressure were quantitativelydetermined in a molecular-beam epitaxy chamber integrated with an X-ray diffractometer. With the help of high angularresolution of synchrotron radiation, disordered sructures appearing in the transition from (2×4) to other phases wereclarified. Energy tunability of synchrotron X-rays allowed for element-sepcific analysis of the c (4×4) struture,providing direct evidence for Ga-As heterodimer formation.
Journal
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- Hyomen Kagaku
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Hyomen Kagaku 33 (9), 507-512, 2012
The Surface Science Society of Japan
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Details 詳細情報について
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- CRID
- 1390001206457929984
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- NII Article ID
- 130004486777
- 10031068499
- 40019432892
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- NII Book ID
- AN00334149
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- ISSN
- 18814743
- 03885321
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- NDL BIB ID
- 023980497
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed