Observation of Graphene-on-Diamond Formation Studied by Real-Time Photoelectron Spectroscopy
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- OGAWA Shuichi
- Tohoku University
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- YAMADA Takatoshi
- National Institute of Advanced Industrial Science and Technology
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- ISHIDZUKA Shinji
- Akita National College of Technology
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- WATANABE Daiki
- Tohoku University
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- YOSHIGOE Akitaka
- Japan Atomic Energy Agency
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- HASEGAWA Masataka
- National Institute of Advanced Industrial Science and Technology
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- TERAOKA Yuden
- Japan Atomic Energy Agency
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- TAKAKUWA Yuji
- Tohoku University
Bibliographic Information
- Other Title
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- リアルタイム光電子分光によるグラフェン・オン・ダイヤモンド形成過程の観察
- リアルタイム コウデンシ ブンコウ ニ ヨル グラフェン ・ オン ・ ダイヤモンド ケイセイ カテイ ノ カンサツ
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Description
Graphene-on-insulator structures are required for fabrication of the graphene transistor. Diamond has been attracted as the substrate for graphene growth because it has a larger band gap and break down voltage compared with SiC. The detail of graphitization on a diamond surface has not yet been clarified because the nondestructive evaluation for graphene on diamond (GOD) structure was hard. In this study, we have developed the evaluation method of GOD based on the photoemission spectroscopy using synchrotron radiation focusing the shift of photoelectron spectra due to band bending. We can clearly determine the graphitization temperature on the diamond C(111) surface as approximately 1120 K, which is lower than that on an SiC substrate. It is also confirmed from C 1s photoelectron spectra, there is the buffer layer at the interface between the grapheme layer and the diamond substrate.
Journal
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- Hyomen Kagaku
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Hyomen Kagaku 33 (8), 449-454, 2012
The Surface Science Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001206458114304
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- NII Article ID
- 10030984239
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- NII Book ID
- AN00334149
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- COI
- 1:CAS:528:DC%2BC38XhtlyntbzN
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- ISSN
- 18814743
- 03885321
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- NDL BIB ID
- 023936787
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed