Damage of Metallic Oxides Appeared in XPS Spectral Change after Ion Bombardment

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  • ＸＰＳスペクトル変化に現れるイオン照射による金属酸化物の損傷
  • XPS スペクトル ヘンカ ニ アラワレル イオン ショウシャ ニ ヨル キンゾク サンカブツ ノ ソンショウ

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Abstract

XPS or AES sputter depth profiling sometimes encounters difficulties with the materials that are damaged by ion bombardment. Therefore, it becomes difficult to determine precise chemical states of such materials. The damages of oxides by ion bombardment as observed in XPS spectra were reviewed. Spectrum changes are classified into three types; (1) additional peaks appear as a result of reduction for one type of the oxides, (2) the spectra are broadened for the second one, and (3) the third type oxides are not chemically changed. It is pointed out that these changes are related to the change of the enthalpy of atomization and ionicity. Secondly, the intensity changes as a function of sputtering time is formulated using reduction cross sections by the ion bombardment and sputtering yield.

Journal

  • Hyomen Kagaku

    Hyomen Kagaku 25 (4), 198-204, 2004

    The Surface Science Society of Japan

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