書誌事項
- タイトル別名
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- The Purification of SiI<SUB>4</SUB> by Recrystallization and Distillation Methods (Preparation of Pure Silicon by the Iodide Process (2))
- ヨン ヨウカ シリコン ノ サイケッショウ オヨビ セイリュウ ニ ヨル セイセイ
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In order to prepare pure silicon by the iodide process, the purification of crude SiI4 by the recrystallization and distillation methods has been examined. By the use of quartz vessels and organic solvents including toluene, n-heptane and benzene in the recrystallization mothod, Ti, Al, and Cu, etc. were removed in a few repeats. Distillation in an all-quartz, 13 theoretical plate column packed with Fenske ring was found to be effective in eliminating Cu, Mg, and Mn etc. and most impurities were found in the residual part of the still.
収録刊行物
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- 日本金属学会誌
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日本金属学会誌 26 (4), 274-277, 1962
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206480969984
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- NII論文ID
- 40018258093
- 130007332340
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- NII書誌ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL書誌ID
- 9153533
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可