書誌事項
- タイトル別名
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- Semi-industrial experiment on the Production of High-purity Silicon by Hydrogen Reduction of Silicon Tetrachloride
- 4エンカ ケイソ ノ スイソ カンゲンホウ ニ ヨル コウジュンド ケイソ セイゾウ ノ チュウカン シケン
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抄録
The fundamental studies on the hydrogen reduction of silicon tetrachloride have been already reported by the present authors. In this paper, the development of production of pure silicon to a semi-industrial scale based on the former studies is presented. Some data on the procedure of this production are also given, namely, the amount of silicon deposition, yield of production, mixing ratio of reaction gas as well as the flow rate of hydrogen. Further, the shape and the aggregate state of silicon crystal are observed. The high-purity silicon prepared by this method is expected to be usable as semiconductor material.
収録刊行物
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- 日本金属学会誌
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日本金属学会誌 24 (1), 9-12, 1960
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206481466112
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- NII論文ID
- 40018257548
- 130007332906
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- NII書誌ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL書誌ID
- 9152988
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可