Producing Experiment by Hydrogen Reduction of Silicon Tetraiodide and its Behaviours (Preparation of Pure Silicon by the Iodide Process (4))
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- Kurosawa Toshio
- National Research Institute for Metals
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- Yagihashi Tetsuo
- National Research Institute for Metals
Bibliographic Information
- Other Title
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- 四ヨウ化シリコンの水素還元の製造実験とその性状
- ヨン ヨウカ シリコン ノ スイソ カンゲン ノ セイゾウ ジッケン ト ソノ セイジョウ
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Abstract
Following on the previously described small-scale hydrogen reduction, a producing experiment has been carried out using a larger apparatus, graphite and quartz tubes for depostion part, and a source material of purified SiI4 etc. in order to examine problems to be accompanied in producing step. A surface of deposition tube was initially dotted with crystal nucleus of silicon, then these developed with successive nucleation and growth. Silicon was deposited in lump, needle and other forms. Particullarly, in order to use SiI4 more effectively, unreacted SiI4 was traped by cooling, and it was returned to the boiler and reacted repeatedly. Properties of single crystals obtained by Czochralski and floating zone methods were investigated.
Journal
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- Journal of the Japan Institute of Metals and Materials
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Journal of the Japan Institute of Metals and Materials 27 (5), 221-225, 1963
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390001206481846016
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- NII Article ID
- 130007333483
- 40018258251
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- NII Book ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL BIB ID
- 9153691
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed