Cu/(001)Ni二層蒸着薄膜の強度に及ぼす不一致転位の影響

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タイトル別名
  • Influence of Misfit Dislocations on the Strength of Cu/(001)Ni Double Layer Evaporated Films
  • cu 001 Ni ニソウ ジョウチャク ハクマク ノ キョウド ニ オヨボス

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In order to develop the composite materials with very high strength and without brittle fracture, as suggested by Koehler, Cu/(001)Ni double layer films were made epitaxially in a vacuum system at a pressure of less than 6.7×10−6 Pa. Interfacial structures of double layer films were investigated by the transmission electron microscope, and the influence of interfacial structures on the strength of double layer films was also discussed.<BR>\oindentThe results are as follows:<BR>(1) The epitaxial growth of Cu films on (001)Ni substrates was a monolayer overgrowth type at the substrate temperatures of 80 and 160°C, and an island growth type at 260 and 350°C.<BR>(2) Cu/(001)Ni double layer films, which were prepared by monolayer overgrowth of Cu films on(001)Ni at the temperature of 160°C, were examined by the transmission electron microscope. The results showed that moiré fringes were observed all over the films, and that as the thickness of Cu films increased, moiré fringe spacings decreased, and finally that misfit dislocations were lying in the deposit-substrate interface. Therefore, it was clarified that misfit between Cu deposit and Ni substrate lattices was accomodated by introduction of misfit dislocations.<BR>(3) Spacings of misfit dislocations in Cu films of various thicknesses were 9.3 nm in average and the direction of dislocation lines was ⟨110⟩, and the Burgers vectors were of the edge type lying in the deposit-substrate interface.<BR>(4) Resolved shear stresses of the Cu/(001)Ni double layer films, which were calculated from the repulsive force due to the stress field of misfit dislocation arrays against the glide dislocations in the Cu film, were zero in the case of screw dislocations parallel to misfit dislocations, but of the order of 109 Pa in the cases of other dislocations. Thus it is necessary to consider the contribution of misfit dislocations to the strengthening of double layer films.

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 43 (3), 155-161, 1979

    公益社団法人 日本金属学会

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